n-channel MOSFET Fabrication

The device fabrication steps are shown for n-channel Metal-Oxide-Semiconductor (MOS) Field Effect Transistor (FET). All photolithography processes are shown by means of animation. The steps shown here are the most detailed and serve as basis for the next few applets showing the device fabrication.

Applet was written for the most part by Mr. Inmook Na, with assistance from Mr. Y. J. Song, under the supervision of C.R. Wie.